Compound, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Yuichi Mukai, Koji Ichikawa
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AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Yuichi Mukai, Koji Ichikawa
Estimating the term…
The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I): wherein, in formula (I), R1 represents a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, and * represents a bonding site to R1, L1 represents a single bond or a hydrocarbon group having 1 to 36 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO2—, R2 represents a saturated hydrocarbon group having 1 to 12 carbon atoms, u1 represents an integer of 0 to 2, s1 represents 1 or 2, t1 represents 0 or 1, in which s1+t1 is 1 or 2, n represents an integer of 2 or more, and a plurality of X1, L1, s1, t1, R2 and u1 each may be the same or different from each other.
A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I):
A compound represented by formula (I1):
A resist composition comprising a resin including a structural unit having an acid-labile group, an acid generator and a compound represented by formula (I):
Dependencies are inferred from the claim text.