Incoming runout measurement method
AssigneeEV Group E. Thallner GmbH
InventorsThomas Wagenleitner, Frank Bogelsack
Life of this patent
Estimating the term…
Abstract
A mark field, having at least two location marks with information for the location of the respective location mark in the mark field, and at least one position mark, which is or can be assigned to one of the location marks. Furthermore, the invention relates to a device for determining X-Y positions of structural features of structures arranged on a substrate, wherein the X-Y positions relative to the mark field, which is fixed with respect to the substrate, can be determined. Furthermore, the invention relates to a corresponding method.
Claims17
A mark field for use in determining X-Y positions of structural features of structures arranged on a substrate, said mark field comprising:
- a plurality of marks located on a substrate holder on which the substrate is fixed, the plurality of marks being located over or underneath the structures, each of said marks comprising:
- one or more location marks containing readable position information enabling a determination of respective locations of the location marks in the mark field, and
- one or more position marks assigned to one of the location marks, each of the position marks being set in relation to the X-Y positions of the structural features of the structures.
A device for determining X-Y positions of structural features of structures arranged on a substrate, wherein the X-Y positions can be determined relatively to a mark field fixed with respect to the substrate, said mark field comprising:
- a plurality of marks located on a substrate holder on which the substrate is fixed, the plurality of marks being located over or underneath the structures, each of said marks comprising:
- one or more location marks containing readable position information enabling a determination of respective locations of the location marks in the mark field, and
- one or more position marks assigned to one of the location marks, each of the position marks being set in relation to the X-Y positions of the structural features of the structures.
A method for determining X-Y positions of structural features of structures arranged on a substrate, the method comprising:
- determining, via a computer, the X-Y positions relatively to a mark field fixed with respect to the substrate, said mark field including a plurality of marks located on a substrate holder on which the substrate is fixed, the plurality of marks being located over or underneath the structures, each of said marks including one or more location marks and one or more position marks assigned to one of the location marks the location marks containing readable position information enabling a determination of respective locations of the location marks in the mark field, each of the position marks being set in relation to the X-Y positions of the structural features of the structures.
Dependencies are inferred from the claim text.