Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern

A compound represented by Chemical Formula 1:

• wherein, in the Chemical Formula 1,
• p is an integer of 2 to 4;
• X is S, a substituted or unsubstituted aryl group, a substituted or unsubstituted heteroaryl group or a substituted or unsubstituted alkyl group, provided that
• when p is an integer of 3 or 4, X is not S;
• L1 is the same as or different from each other and each independently is a direct bond, a substituted or unsubstituted alkylene group, a substituted or unsubstituted arylene group, or a substituted or unsubstituted heteroarylene group;
• Rb is the same as or different from each other and each independently is a substituted or unsubstituted alkyl group, a substituted or unsubstituted cycloalkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heteroaryl group;
• Q+ is the same as or different from each other and each independently is an onium cation;
• Y− is the same as or different from each other and each independently is an acid anion;
• and
• m and n are each an integer of 1 to 10.