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US 11,674,237 B2Granted
Method for fabricating a crystalline metal-phosphide hetero-layer by converting first and second crystalline metal-source layers into first and second crystalline metal phosphide layers
AssigneeInternational Business Machines Corporation
InventorsYannick Baumgartner, Bernd W. Gotsmann, Jean Fompeyrine, Lukas Czornomaz
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Abstract
Fabricating a crystalline metal-phosphide layer may include providing a crystalline base substrate and a step of forming a crystalline metal-source layer. The method may further include performing a chemical conversion reaction to convert the metal-source layer to the crystalline metal phosphide layer. One or more corresponding semiconductor structures can be also provided.
Claims11
A method for fabricating a crystalline metal-phosphide hetero-layer, the method comprising;
- providing a crystalline base substrate;
- forming a crystalline buffer layer on the crystalline base substrate;
- forming a first crystalline metal-source layer comprising a first metal source on the crystalline buffer layer, wherein the first crystalline metal-source is a metal oxide of W, Mo or Nb, or a metal nitride of W, Mo or Nb;
- forming a second crystalline metal-source layer comprising a second metal-source on the first crystalline metal-source layer, wherein the second crystalline metal-source is a metal oxide of W, Mo or Nb, or a metal nitride of W, Mo or Nb and is compositionally different from the first metal-source;
- performing a chemical conversion reaction to convert the first crystalline metal-source layer into a first crystalline metal phosphide layer;
- and
- performing a chemical conversion reaction to convert the second crystalline metal-source layer into a second crystalline metal phosphide layer.
4 more elements
Dependencies are inferred from the claim text.