Erosion / corrosion resistant barrier coating
AssigneesConax Technologies LLC, Alfred University
InventorsMatthew M. Hall, Timothy Keenan, Lana Margaret Placek, Scott Michael Kroon, William Sean Halligan, Michael Edward Ferraro
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Abstract
Disclosed are barrier coatings for fused silica components used in semiconductor processing. In particular, the present disclosure concerns protective substrate-barrier coatings composed of corrosion-resilient metal compounds which provide superior resistance to erosion/corrosion when a coated substrate is subjected to the acidic environments at elevated temperatures typical for semiconductor processing.
Claims27
An improved fused silica surfaced apparatus for use in the high temperature acid environment of a chemical vapor deposition reaction chamber used for semiconductor processing, the improvement comprising an alumina-free coating comprising a tantalum compound barrier on the fused silica surface, the barrier sufficient to resist erosion of the fused silica at temperatures in excess of 1000° C. in the presence of hydrochloric acid.
A method of applying an aluminum-free coating comprising a protective barrier to a fused silica surfaced apparatus used in a chemical vapor deposition reaction chamber for semiconductor processing, the method comprising:
- applying a mixture of (i) at least one tantalum compound, (ii) at least one thixotropic matrix component;
- and (iii) an inert solvent, to the fused silica surface, and thermochemically reacting the mixture to form the barrier sufficient to resist devitrification at temperatures in excess of 1000° C. in the presence of hydrochloric acid.
Dependencies are inferred from the claim text.