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US 11,674,047 B2Granted
Composition for manufacturing passivation layer and passivation layer using the same
AssigneesThe Chemours Company Fc, LLC, Nepes Co., Ltd.
InventorsEunhwa Jung, Jinkuk Kim, Hyoyeon Kim, Seungsun Jang, Bonggyu Kim, Xudong Chen
Life of this patent
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Abstract
The present invention relates to a composition for manufacturing a passivation layer, and specifically, to a composition for manufacturing a passivation layer and a passivation layer formed using the composition, which simultaneously exhibit effects such as a low dielectric constant, a low water absorption rate, excellent pattern formability, and excellent adhesion to an adherend surface.
Claims18
A composition for manufacturing a passivation layer, comprising:
- a fluorocopolymer which is a random copolymer of monomers comprising a fluoroolefin-based compound, a vinyl ether-based compound, and a crosslinkable compound selected from the group consisting of silane-based compounds having at least one alkenyl group and epoxide-based compounds having at least one alkenyl group;
- and
- a diol-based adhesion promoter.
A composition for manufacturing a passivation layer, comprising:
- a fluorocopolymer which is a random copolymer of monomers comprising a fluoroolefin-based compound, a vinyl ether-based compound, and a crosslinkable compound selected from the group consisting of silane-based compounds having at least one alkenyl group and epoxide-based compounds having at least one alkenyl group;
- and
- a thiol-based adhesion promoter selected from the group consisting of 3-(triethoxysilyl) propanethiol (MPTES), 6-mercapto-1-hexanol, 3-mercaptopropionic acid, 11-mercapto-1-undecanol, and 3-(trimethoxysilyl) propanethiol (MPTMS).
Dependencies are inferred from the claim text.