Edge exclusion apparatus and methods of using the same
AssigneeCanon Kabushiki Kaisha
InventorByung-Jin Choi
Life of this patent
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Abstract
A method of deposition is disclosed. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography, and where the substrate includes an active zone and an exclusion zone. The method can also include curing the formable material in the exclusion zone to form a circular edge between the exclusion zone and the active zone, contacting the formable material with a superstrate, and curing the formable material in the active zone to form a layer over the substrate, wherein curing is performed while the superstrate is contacting the formable material.
Claims15
A method of deposition, comprising:
- dispensing a formable material over a substrate, wherein the surface area of the substrate is divided into an active zone and an exclusion zone, and wherein the exclusion zone of the substrate circumferentially surrounds the active zone of the substrate;
- contacting the formable material over the substrate with a superstrate;
- curing the formable material to form a circular boundary area of the exclusion zone, wherein the circular boundary area of the exclusion zone faces the active zone, wherein curing the formable material to form the circular boundary area of the exclusion zone is provided by rotating one or more light sources relative the substrate around a central axis of the substrate, wherein the entire exclusion zone is cured by irradiating light from the one or more light sources while rotating along the exclusion zone relative the central axis of the substrate;
- and
- curing the formable material in the active zone to form a layer over the substrate, wherein curing is performed while the superstrate is contacting the formable material.
A method of manufacturing an article, comprising:
- dispensing a formable material over a substrate, wherein the surface area of the substrate is divided into an active zone and an exclusion zone, and wherein the exclusion zone of the substrate circumferentially surrounds the active zone of the substrate;
- contacting the formable material over the substrate with a superstrate;
- curing the formable material to form a circular boundary area of the exclusion zone, wherein the circular boundary area of the exclusion zone faces the active zone, wherein curing the formable material to form the circular boundary area of the exclusion zone is provided by rotating one or more light sources relative the substrate around a central axis of the substrate, wherein the entire exclusion zone is cured by irradiating light from the one or more light sources while rotating along the exclusion zone relative the central axis of the substrate;
- curing the formable material in the active zone to form a planar layer over the substrate, wherein curing is performed while the superstrate is contacting the formable material;
- separating the superstrate and the planar layer on the substrate;
- processing the substrate on which the planar layer has been formed;
- and
- manufacturing the article from the processed substrate.
Dependencies are inferred from the claim text.