Back to results
US 11,661,387 B2Granted
High-purity 1,1,1,2,3,3-hexafluoropropane, method for producing same and use thereof
AssigneeArkema France
InventorsLaurent Wendlinger, Dominique Deur-Bert
Life of this patent
Estimating the term…
Abstract
The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.
Claims9
A composition comprising at least 99.9% by weight of 1,1,1,2,3,3-Hexafluoropropane (HFC-236ea), and one or more compounds selected from the group consisting of hexafluorocyclopropane (cyclo-C3F6) and octafluorocyclobutane (cyclo-C4F8), wherein the one or more compounds is present in the composition in an amount of at most 500 ppm.
Dependencies are inferred from the claim text.