Imprint apparatus, imprint method, and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorTakahiro Toyoshima
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorTakahiro Toyoshima
Estimating the term…
An imprint apparatus that forms a pattern on a substrate by using a mold, the apparatus comprises a supply unit configured to supply an imprint material to the substrate; a contact unit configured to contact the imprint material that has been supplied to the substrate with a mold; a substrate stage configured to move the substrate; a gas supply unit that is provided between the supply unit and the contact unit, and supply gas toward the substrate; and a flow volume adjustment unit configured to adjust a flow volume of the gas that is supplied from the gas supply unit, while the substrate stage moves the substrate from a supply position at which the imprint material is supplied by the supply unit to a contact position at which the imprint material is contacted with the mold by the contact unit.
A method for forming a material on a substrate using a mold, the method comprising steps of:
A method of manufacturing an article, the method comprising steps of:
Dependencies are inferred from the claim text.