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US 11,644,754 B2Granted
Photosensitive siloxane composition and cured film formed by using the same
AssigneeMerck Patent GmbH
InventorsNaofumi Yoshida, Megumi Takahashi, Katsuto Taniguchi, Toshiaki Nonaka
Life of this patent
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Abstract
To provide a photosensitive composition capable of easily forming a cured film having a low refractive index. The present invention provides a photosensitive siloxane composition comprising: a polysiloxane, a photosensitive agent, hollow silica particles, and a solvent. The hollow silica particles contain voids inside, and have outer surfaces subjected to hydrophobic treatment.
Claims19
A photosensitive siloxane composition, comprising:
- (I) a polysiloxane comprising a repeating unit represented by the following formula (Ia):
- in which
- R1 is hydrogen, a mono- to trivalent saturated or unsaturated straight, branched or cyclic aliphatic hydrocarbon group of C1 to 30, or a mono- to trivalent aromatic hydrocarbon group of C6 to 30;
- provided that,
- in said aliphatic or aromatic hydrocarbon group,
- one or more methylene is substituted with oxy, imido or carbonyl, or unsubstituted,
- one or more hydrogen is substituted with fluorine, hydroxy or alkoxy, or unsubstituted, and
- one or more carbon is substituted with a silicon, or unsubstituted;
- and further
- provided that, if R1 is a di- or trivalent group, R1 links Si atoms contained in the plural repeating units;
- (II) a photosensitive agent,
- (III) hydrophobic hollow silica particles which have structures comprising inside voids and silica layers enclosing said voids, said silica layer comprising an organic substance, and said hydrophobic hollow silica particles have a mean particle size of 30 to 200 nm, and
- (IV) a solvent.
10 more elements
A photosensitive siloxane composition, comprising:
- (I) a polysiloxane comprising a repeating unit represented by the following formula (Ia):
- in which
- R1 is hydrogen, a mono- to trivalent saturated or unsaturated straight, branched or cyclic aliphatic hydrocarbon group of C1 to 30, or a mono- to trivalent aromatic hydrocarbon group of C6 to 30;
- provided that,
- in said aliphatic or aromatic hydrocarbon group,
- one or more methylene is substituted with oxy, imido or carbonyl, or unsubstituted,
- one or more hydrogen is substituted with fluorine, hydroxy or alkoxy, or unsubstituted, and
- one or more carbon is substituted with a silicon, or unsubstituted;
- and further
- provided that, if R1 is a di- or trivalent group, R1 links Si atoms contained in the plural repeating units;
- (II) a photosensitive agent,
- (III) hydrophobic hollow silica particles which have structures comprising inside voids and silica layers enclosing said voids, said silica layer comprising a binder, and said hydrophobic hollow silica particles have a mean particle size of 30 to 200 nm, and
- (IV) a solvent.
10 more elements
Dependencies are inferred from the claim text.