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US 11,644,419 B2Granted
Measurement of properties of patterned photoresist
AssigneeKLA Corporation
InventorsRoie Volkovich, Liran Yerushalmi, Amnon Manassen, Yoram Uziel
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Abstract
A method for optical inspection includes illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths, measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths, and based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.
Claims18
A method for optical inspection, comprising:
- illuminating a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths;
- measuring spectral properties of the optical radiation reflected from multiple points on the patterned polymer layer over the range of infrared wavelengths;
- and
- based on the measured spectral properties, computing a complex refractive index of the patterned polymer layer.
1 more element
An optical inspection apparatus comprising:
- an illumination assembly, configured to illuminate a patterned polymer layer on a semiconductor wafer with optical radiation over a range of infrared wavelengths;
- a detector array;
- an imaging assembly configured to image the optical radiation reflected from multiple points on the patterned polymer layer onto the detector array;
- and
- a controller configured to read out and process signals from the detector array in response to the reflected radiation so as to measure spectral properties of the radiation reflected from the multiple points, and based on the measured spectral properties, to compute a complex refractive index of the patterned polymer layer.
2 more elements
Dependencies are inferred from the claim text.