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US 11,643,631 B2Granted
In vitro exposure system
AssigneesElectronics and Telecommunications Research Institute, Foundation for Research and Business, Seoul National University of Science and Technology
InventorsYoung Seung Lee, Jae-Young Chung, Sang Bong Jeon
Life of this patent
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Abstract
Disclosed is an in vitro exposure system that may radiate a uniform field having a constant wavefront to an experimental cell container and expose each cell container to a same electromagnetic field.
Claims9
A chamber-type cell exposure device, comprising:
- a uniform field controller configured to radiate an electromagnetic field to a uniform field area formed around a position of a cell container arranged in the chamber-type cell exposure device;
- a temperature sensor configured to sense an internal temperature of the chamber-type cell exposure device that increases by the electromagnetic field radiated to the uniform field area;
- an air-cooling ventilation controller configured to control an air flow by adjusting an internal ventilation speed of the chamber-type cell exposure device based on the internal temperature sensed by the temperature sensor;
- a detachable support configured to adjust a position of the cell container to be arranged in the uniform field area;
- a planar scan probe configured to monitor a flatness and an exposure efficiency of the electromagnetic field radiated from the uniform field controller based on an amount of the electromagnetic field exposed to the uniform field area;
- and
- a position controller configured to triaxially control a position of the planar scan probe.
4 more elements
Dependencies are inferred from the claim text.