Black matrix and method for manufacturing the same, and color filter substrate and method for manufacturing the same

A method for manufacturing a color filter substrate, comprising:

• providing a substrate;
• forming a sacrificial layer on the substrate, the sacrificial layer comprising a plurality of sacrificial patterns, each of the sacrificial patterns having one end close to the substrate and another end farther away from the substrate, wherein the end farther away from the substrate is wider than the end close to the substrate;
• forming a light shielding film layer on the sacrificial layer, wherein the light shielding film layer comprises a plurality of first light shielding patterns and a plurality of second light shielding patterns, and each of the second light shielding patterns and an adjacent first light shielding pattern are separated by the sacrificial pattern;
• removing the sacrificial layer and the second light shielding pattern and forming the black matrix;
• forming a plurality of color resists on the black matrix, each of the color resists being located between two adjacent first light shielding patterns.