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US 11,640,897 B2Granted
Charged particle beam device
AssigneeHitachi High-Technologies Corporation
InventorsRyo Hirano, Tsunenori Nomaguchi, Chisato Kamiya, Junichi Katane
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Abstract
The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.
Claims9
A charged particle beam apparatus for irradiating a specimen with a charged particle beam, the apparatus comprising:
- an electron beam irradiation unit that emits an electron beam to the specimen;
- and
- an objective lens for focusing the electron beam on the specimen, wherein
- the objective lens includes
- a first magnetic pole piece,
- a second magnetic pole piece that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,
- a first coil that is disposed between the first magnetic pole piece and the second magnetic pole piece, and
- a second coil that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,
- the charged particle beam apparatus further comprises:
- a control unit that controls a current to be passed to the first coil and a current to be passed to the second coil;
- and
- a storage unit that stores an instruction to the control unit, wherein
- according to the instruction stored in the storage unit, the control unit performs at least one of a first mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing a direct current to the second coil after turning off a current flowing through to the first coil and a second mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing an alternating current to the second coil after turning off a current flowing through to the first coil;
- and
- an ion beam irradiation unit that emits a focused ion beam to the specimen, wherein
- the control unit irradiates the specimen with the focused ion beam by controlling the ion beam irradiation unit while performing the first mode to process the specimen.
13 more elements
A charged particle beam apparatus for irradiating a specimen with a charged particle beam, the apparatus comprising:
- an electron beam irradiation unit that emits an electron beam to the specimen;
- and
- an objective lens for focusing the electron beam on the specimen, wherein
- the objective lens includes
- a first magnetic pole piece,
- a second magnetic pole piece that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,
- a first coil that is disposed between the first magnetic pole piece and the second magnetic pole piece, and
- a second coil that is disposed at a position away from an electron beam path with respect to the first magnetic pole piece,
- the charged particle beam apparatus further comprises:
- a control unit that controls a current to be passed to the first coil and a current to be passed to the second coil;
- and
- a storage unit that stores an instruction to the control unit, wherein
- according to the instruction stored in the storage unit, the control unit performs at least one of a first mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing a direct current to the second coil after turning off a current flowing through to the first coil and a second mode for reducing an effect of a residual magnetic field remaining in the second magnetic pole piece by passing an alternating current to the second coil after turning off a current flowing through to the first coil;
- an ion beam irradiation unit that emits a focused ion beam to the specimen;
- and
- a user interface for inputting an instruction to the control unit, wherein
- the user interface has a specification field for specifying which of the first mode and the second mode is to be performed when the specimen is processed by using the focused ion beam, and
- according to the instruction entered for the specification field,
- the control unit performs at least one of the first mode and the second mode when processing the specimen by using the focused ion beam.
16 more elements
Dependencies are inferred from the claim text.