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US 11,639,025 B2Granted
Methods for photo-induced metal printing
AssigneeThe Regents of the University of California
InventorsXimin He, Xingyun Yang, Dong Wu, Mutian Hua
Life of this patent
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Abstract
Methods and apparatus for fabricating high-resolution thin-layer metal patterns and 3D Metal structures are provided. The methods and apparatus operate via photo-(stereo)lithography at room temperature. The printed metal patterns, for example silver patterns, exhibit high electrical conductivity, comparable to or better than the conductivity of the silver printed by current laser sintering or thermal annealing at high temperature.
Claims19
A method for printing metal patterns comprising:
- immersing a substrate into a bath of photosensitive metal ink, wherein the photo sensitive metal ink comprises an aqueous solution including a decomposable organic silver salt or a decomposable inorganic silver salt;
- and
- while the substrate is immersed in the bath of photosensitive metal ink, focusing an emission of a light source through a light patterning structure onto at least a portion of the substrate such that a patterned design of light is projected thereon;
- wherein the emission has a wavelength such that a metal ion reduction reaction is initiated in the photosensitive metal ink at the portion of the substrate onto which the patterned design of light is projected such that the metal ink is decomposed to form and dispose a metal pattern on the substrate, said metal pattern being identical in conformation to the patterned design of light.
1 more element
An apparatus for printing metal patterns comprising:
- a substrate;
- a light source for producing an emission;
- a light patterning structure in optical alignment between the light source and the substrate such that the emission forms a patterned design of light on the substrate;
- and
- a reservoir of a photosensitive metal ink comprising an aqueous solution including a decomposable organic silver salt or a decomposable inorganic silver salt in moving relation relative to the substrate such that at least the portion of the substrate having the patterned design of light projected thereon is immersed within the reservoir;
- wherein the emission has a wavelength such that when the substrate is immersed in the reservoir a metal ion reduction reaction is initiated in the photosensitive metal ink at the portion of the substrate onto which the patterned design of light is projected such that the metal ink is decomposed to form and dispose a metal pattern on the substrate, said metal pattern being identical in conformation to the patterned design of light.
3 more elements
Dependencies are inferred from the claim text.