Dielectric electromagnetic structure and method of making the same

A method of making a dielectric, Dk, electromagnetic, EM, structure having a plurality of a first dielectric portion, 1DP, and a plurality of a second dielectric portion, 2DP, each 1DP having a proximal end and a distal end, the method comprising:

• providing a support form;
• disposing a sheet of a polymer on the support form;
• providing a stamping form and stamping, down then up, the sheet of polymer supported by the support form, the stamping form comprising a plurality of substantially identically configured projections arranged in an array, wherein the stamping results in displaced material of the sheet of polymer, a plurality of depressions having a blind end arranged in the array in the sheet of polymer, and a plurality of raised walls of the sheet of polymer surrounding each one of the plurality of depressions, the plurality of raised walls forming the plurality of 2DPs;
• filling a flowable form of a curable Dk composition into the plurality of depressions, wherein each depression of the plurality of depressions forms a corresponding one of the plurality of 1DPs having a first average dielectric constant, wherein the sheet of polymer has a second average dielectric constant that is less than the first average dielectric constant, wherein the distal end of each 1DP is proximate an upper surface of the plurality of raised walls of the sheet of polymer;
• removing any excess Dk composition above the upper surface of the plurality of raised walls of the sheet of polymer, leaving the Dk composition flush with the upper surface of the plurality of raised walls;
• at least partially curing the curable Dk composition to form at least one array of the plurality of 1DPs;
• removing from the support form a resulting assembly comprising the stamped sheet of polymer material with the plurality of raised walls, the plurality of depressions, and the at least one array of the plurality of 1DPs formed in the plurality of depressions.

A method of making a dielectric, Dk, electromagnetic, EM, structure having a plurality of a first dielectric portion, 1DP, and a plurality of a second dielectric portion, 2DP, the method comprising:

• providing a substrate;
• disposing a layer of photoresist on top of the substrate;
• disposing a photomask on top of the photoresist, the photomask comprising a plurality of substantially identically configured opaque covers arranged in an array, thereby providing non-exposed photoresist in areas covered by the opaque covers, and exposed photoresist in areas not covered by the opaque covers;
• exposing at least the exposed photoresist to EM radiation;
• removing the non-exposed photoresist from the substrate, resulting in a plurality of substantially identically configured portions of remaining photoresist arranged in the array that form corresponding ones of the plurality of 1DPs having a first average dielectric constant;
• optionally shaping via a stamping form each 1DP of the plurality of 1DPs into a dome structure having a convex distal end;
• filling a flowable form of a curable Dk composition into spaces between the plurality of 1DPs, wherein the filled spaces provide corresponding ones of the plurality of 2DPs having a second average dielectric constant that is less than the first average dielectric constant;
• optionally removing any excess Dk composition above an upper surface of the plurality of 1DPs, leaving the Dk composition flush with the upper surface of the plurality of 1DPs;
• at least partially curing the curable Dk composition, resulting in at least one array of the plurality of 1DPs surrounded by the plurality of 2DPs.

A method of making a dielectric, Dk, electromagnetic, EM, structure having a plurality of a first dielectric portion, 1DP, and a plurality of a second dielectric portion, 2DP, the method comprising:

• providing a substrate;
• disposing a layer of photoresist on top of the substrate;
• disposing a grayscale photomask on top of the photoresist, the grayscale photomask comprising a plurality of substantially identically configured covers arranged in an array, the covers of the grayscale photomask comprising an opaque central region transitioning to a partially translucent outer region, thereby providing non-exposed photoresist in areas covered by the opaque region, partially exposed photoresist in areas covered by the partially translucent region, and fully exposed photoresist in areas not covered by the covers;
• exposing the grayscale photomask and the fully exposed photoresist to EM radiation;
• removing the partially and fully exposed photoresist subjected to the EM radiation exposure, resulting in a plurality of substantially identically shaped forms of remaining photoresist arranged in the array that form the plurality of 1DPs having a first average dielectric constant;
• filling a flowable form of a curable Dk composition into spaces between the plurality of 1DPs, wherein the filled spaces provide corresponding ones of the plurality of 2DPs having a second average dielectric constant that is less than the first average dielectric constant;
• optionally removing any excess Dk composition above an upper surface of the plurality of 1DPs, leaving the Dk composition flush with the upper surface of the plurality of 1DPs;
• at least partially curing the curable Dk composition, resulting in an assembly comprising the substrate and the at least one array of the plurality of 1DPs having the substantially identically shaped forms surrounded by the plurality of 2DPs disposed on the substrate.