Manufacturing method for multilayer structure of magnetic body and BiSb layer, magnetoresistive memory, and pure spin injection source
AssigneeTokyo Institute of Technology
InventorsNam Hai Pham, Huynh Duy Khang Nguyen
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Abstract
A magnetoresistive memory cell includes an MTJ element including a magnetization free layer and a pure spin injection source. The pure spin injection source includes a BiSb layer coupled to the magnetization free layer. By flowing an in-plane current through the BiSb layer, this arrangement is capable of providing magnetization reversal of the magnetization free layer.
Claims9
Magnetoresistive memory comprising:
- an MTJ (magnetic tunnel junction) element comprising a magnetization free layer;
- and
- a pure spin injection source comprising a BiSb layer structured as a topological insulator having a spin Hall angle larger than 0.5 and a conductivity on the order of 105 Ω−1m−1 due to a topological surface state, which is coupled to the magnetization free layer via an interface,
- wherein the interface is provided such that it is orthogonal to the direction of crystal growth of the BiSb layer,
- and wherein the magnetoresistive memory is structured to flow an in-plane current through the BiSb layer so as to supply a pure spin current to the magnetization free layer in a direction that is perpendicular to the interface, thereby providing magnetization reversal of the magnetization free layer.
A manufacturing method for magnetoresistive memory, comprising:
- forming a magnetization free layer;
- and
- forming a pure spin injection source comprising a BiSb layer,
- wherein the BiSb layer has a (012) orientation.
A pure spin injection source structured to inject a pure spin current to a magnetic body,
- wherein the pure spin injection source comprises a BiSb layer structured as a topological insulator having a spin Hall angle larger than 0.5 and a conductivity on the order of 105 Ω−1m−1 due to a topological surface state, which is coupled to the magnetic body via an interface,
- wherein the interface is provided such that it is orthogonal to the direction of crystal growth of the BiSb layer,
- and wherein a pure spin current is supplied to the magnetic body in a direction that is perpendicular to the interface according to an in-plane current that flows through the BiSb layer.
Magnetoresistive memory comprising:
- an MTJ (magnetic tunnel junction) element comprising a magnetization free layer;
- and
- a pure spin injection source comprising a BiSb layer coupled to the magnetization free layer,
- wherein a lower layer having a cubic crystal structure is employed so as to provide the BiSb layer with a (012) orientation.
Dependencies are inferred from the claim text.