Integrated circuit device and method of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsYoonyoung Choi, SangJae Park, Dongkyun Lee
Life of this patent
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AssigneeSamsung Electronics Co., Ltd.
InventorsYoonyoung Choi, SangJae Park, Dongkyun Lee
Estimating the term…
An integrated circuit device including a lower electrode on a substrate, the lower electrode including a first lower electrode portion extending in a first direction perpendicular to a top surface of the substrate and including a first main region and a first top region, and a second lower electrode portion extending in the first direction on the first lower electrode portion and including a second main region and a second top region; a first top supporting pattern surrounding at least a portion of a side wall of the first top region of the first lower electrode portion; and a second top supporting pattern surrounding at least a portion of a side wall of the second top region of the second lower electrode portion, and the second lower electrode portion includes a protrusion protruding outward to the second top supporting pattern.
An integrated circuit device comprising:
An integrated circuit device comprising:
An integrated circuit device comprising:
Dependencies are inferred from the claim text.