Method of manufacturing display panel utilizing ratio of etching removal speeds and display panel manufactured by the same

A method of manufacturing a display panel, the method comprising:

• forming a circuit layer including a gate, a source, and a drain on a base substrate;
• and
• forming a light emitting element layer on the circuit layer,
• wherein the forming of the circuit layer comprises:
• forming a preliminary metal layer;
• forming a preliminary oxide layer comprising molybdenum and tantalum on the preliminary metal layer;
• forming a preliminary capping layer comprising at least one compound selected from AZO, GZO, ITZO, IZO, ZIO, and ZTO on the preliminary oxide layer;
• cleaning a preliminary electrode layer comprising the preliminary metal layer, the preliminary oxide layer, and the preliminary capping layer;
• forming a photoresist layer pattern on the preliminary electrode layer;
• etching the preliminary electrode layer on which the photoresist layer pattern is formed to form a metal layer, oxide layer and capping layer from the preliminary metal layer, the preliminary oxide layer and the preliminary capping layer, respectively;
• and
• removing the photoresist layer pattern, wherein the etching is performed using an etching solution including phosphoric acid, acetic acid and nitric acid, and
• wherein during the etching of the preliminary electrode layer, a ratio between a removal speed ER1 of the preliminary oxide layer and a removal speed ER2 of the preliminary metal layer satisfies Equation 1
• 1≤ER2/ER1≤3 [Equation 1]
• wherein in Equation 1, ER1 and ER2 are removal speeds of the preliminary oxide layer and the preliminary metal layer in the same unit area, respectively.