Substrate processing apparatus with moving device for connecting and disconnecting heater electrodes and substrate processing method thereof

A substrate processing apparatus, comprising:

• a rotary table configured to hold a substrate horizontally;
• a rotation driving device configured to rotate the rotary table around a vertical axis;
• an electric heater provided at the rotary table to be rotated along with the rotary table and configured to heat the substrate placed on the rotary table;
• a power receiving electrode provided at the rotary table to be rotated along with the rotary table and electrically connected to the electric heater;
• a power feeding electrode configured to be contacted with the power receiving electrode to supply a power to the electric heater via the power receiving electrode;
• an electrode moving device configured to connect and disconnect the power feeding electrode and the power receiving electrode relatively;
• a power feeder configured to supply the power to the power feeding electrode;
• a processing cup disposed to surround the rotary table, and connected to an exhaust pipeline and a drain pipeline;
• at least one processing liquid nozzle configured to supply a processing liquid onto the substrate;
• a processing liquid supply device configured to supply the processing liquid to the at least one processing liquid nozzle;
• and
• a controller configured to control the electrode moving device, the power feeder, the rotation driving device and the processing liquid supply device,
• wherein the rotary table is configured to be rotated within a preset angular range in a state that the power receiving electrode and the power feeding electrode are contacted with each other.

A substrate processing apparatus, comprising:

• a rotary table configured to hold a substrate horizontally;
• a rotation driving device configured to rotate the rotary table around a vertical axis;
• an electric heater provided at the rotary table to be rotated along with the rotary table and configured to heat the substrate placed on the rotary table;
• a power receiving electrode provided at the rotary table to be rotated along with the rotary table and electrically connected to the electric heater;
• a power feeding electrode configured to be contacted with the power receiving electrode to supply a power to the electric heater via the power receiving electrode;
• an electrode moving device configured to connect and disconnect the power feeding electrode and the power receiving electrode relatively;
• a power feeder configured to supply the power to the power feeding electrode;
• a processing cup disposed to surround the rotary table, and connected to an exhaust pipeline and a drain pipeline;
• at least one processing liquid nozzle configured to supply a processing liquid onto the substrate;
• a processing liquid supply device configured to supply the processing liquid to the at least one processing liquid nozzle;
• and
• a controller configured to control the electrode moving device, the power feeder, the rotation driving device and the processing liquid supply device,
• wherein the electric heater comprises multiple heater elements respectively configured to heat different regions of the substrate, and
• the controller is configured to control calorific powers of the multiple heater elements individually via the power feeder.

A substrate processing apparatus, comprising:

• a rotary table configured to hold a substrate horizontally;
• a rotation driving device configured to rotate the rotary table around a vertical axis;
• an electric heater provided at the rotary table to be rotated along with the rotary table and configured to heat the substrate placed on the rotary table;
• a power receiving electrode provided at the rotary table to be rotated along with the rotary table and electrically connected to the electric heater;
• a power feeding electrode configured to be contacted with the power receiving electrode to supply a power to the electric heater via the power receiving electrode;
• an electrode moving device configured to connect and disconnect the power feeding electrode and the power receiving electrode relatively;
• a power feeder configured to supply the power to the power feeding electrode;
• a processing cup disposed to surround the rotary table, and connected to an exhaust pipeline and a drain pipeline;
• at least one processing liquid nozzle configured to supply a processing liquid onto the substrate;
• a processing liquid supply device configured to supply the processing liquid to the at least one processing liquid nozzle;
• a controller configured to control the electrode moving device, the power feeder, the rotation driving device and the processing liquid supply device;
• and
• a first power transmission device and a second power transmission device configured to supply the power to the electric heater,
• wherein the first power transmission device comprises the power receiving electrode and the power feeding electrode configured to be connected to or disconnected from each other by the electrode moving device,
• the second power transmission device comprises a fixed member and a rotary member configured to be rotated relative to each other,
• the second power transmission device is configured to supply the power from the fixed member to the rotary member even when the rotary member is being continuously rotated with respect to the fixed member,
• the rotary member is electrically connected to the electric heater, and fixed to the rotary table or a member configured to be rotated along with the rotary table,
• the power feeder is configured to supply the power to the fixed member of the second power transmission device, and
• the controller is configured to supply the power to the electric heater from the power feeder via the second power transmission device at least within a separation period during which the power receiving electrode is spaced apart from the power feeding electrode.

A substrate processing apparatus, comprising:

• a rotary table configured to hold a substrate horizontally;
• a rotation driving device configured to rotate the rotary table around a vertical axis;
• an electric heater provided at the rotary table to be rotated along with the rotary table and configured to heat the substrate placed on the rotary table;
• a power feeder configured to supply a power to the electric heater;
• a power transmission device provided in a power transmission path between the electric heater and the power feeder, the power transmission device comprising a fixed member and a rotary member configured to be rotated relative to each other, the power transmission device being configured to supply the power from the fixed member to the rotary member even when the rotary member is being continuously rotated with respect to the fixed member, and the rotary member being electrically connected to the electric heater and fixed to the rotary table or a member configured to be rotated along with the rotary table;
• a processing cup disposed to surround the rotary table, and connected to an exhaust pipeline and a drain pipeline;
• at least one processing liquid nozzle configured to supply a processing liquid onto the substrate;
• a processing liquid supply device configured to supply the processing liquid to the at least one processing liquid nozzle;
• and
• a controller configured to control the power feeder, the rotation driving device and the processing liquid supply device.

A substrate processing method of processing a substrate by using a substrate processing apparatus including:

• a rotary table configured to hold the substrate horizontally;
• a rotation driving device configured to rotate the rotary table around a vertical axis;
• an electric heater provided at the rotary table to be rotated along with the rotary table and configured to heat the substrate placed on the rotary table;
• a power receiving electrode provided at the rotary table to be rotated along with the rotary table and electrically connected to the electric heater;
• a power feeding electrode configured to be contacted with the power receiving electrode configured to supply a power to the electric heater via the power receiving electrode;
• an electrode moving device configured to connect and disconnect the power feeding electrode and the power receiving electrode relatively;
• a power feeder configured to supply the power to the power feeding electrode;
• a processing cup disposed to surround the rotary table and connected to an exhaust pipeline and a drain pipeline;
• a processing liquid nozzle configured to supply a processing liquid onto the substrate;
• a processing liquid supply device configured to supply the processing liquid to the processing liquid nozzle, the substrate processing method comprising:
• holding the substrate on the rotary table horizontally;
• forming, by supplying a chemical liquid as the processing liquid onto a top surface of the substrate, a puddle of the chemical liquid covering an entire top surface of the substrate;
• processing the substrate with the chemical liquid by supplying the power to the electric heater from the power feeder in a state that the power receiving electrode and the power feeding electrode are contacted with each other and by heating the substrate and the chemical liquid on the substrate;
• and
• removing the chemical liquid from the rotary table and the substrate by distancing the power receiving electrode and the power feeding electrode apart from each other and rotating the rotary table continuously.