Alignment module with a cleaning chamber

An integrated platform for processing a substrate, the integrated platform comprising:

• a transfer chamber comprising a substrate transfer robot;
• a factory interface comprising:
• a substrate carrier chamber configured to receive a substrate and chuck the substrate to a carrier;
• and
• a factory interface transfer robot configured to transfer the substrate and the carrier from the factory interface to the transfer chamber;
• and
• a plurality of processing chambers and an alignment module coupled to the transfer chamber, wherein the alignment module comprises:
• a mask stocker configured to house a mask cassette configured to store a plurality of masks, the mask stocker comprising a first valve assembly;
• a cleaning chamber configured to clean a mask of the plurality of masks, the cleaning chamber comprising a second valve assembly;
• an alignment chamber coupled to the mask stocker via the first valve assembly and the cleaning chamber via the second valve assembly, the alignment chamber comprising:
• an alignment stage configured to support the carrier and the substrate;
• and
• a transfer robot configured to transfer the mask to the cleaning chamber from one or more of the alignment stage and the mask stocker;
• and
• an alignment system comprising one or more cameras, the alignment system configured to:
• acquire one or more images of the mask and the substrate, the mask comprising first alignment elements and the substrate comprising second alignment elements;
• and
• position, based on the one or more images, the second alignment elements within the first alignment elements to align the mask with the substrate.