Nanosecond pulser pulse generation
AssigneeEagle Harbor Technologies, Inc.
InventorsTimothy Ziemba, Ilia Slobodov, John Carscadden, Kenneth Miller, Morgan Quinley
Life of this patent
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Abstract
Some embodiments include a high voltage pulsing power supply. A high voltage pulsing power supply may include: a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width greater than about 1 μs, and a pulse repetition frequency greater than about 20 kHz; a plasma chamber; and an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce a pulsing an electric field within the chamber.
Claims20
A high voltage pulsing power supply comprising:
- a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width less than about 1 μs, and a pulse repetition frequency greater than about 20 kHz;
- a plasma chamber;
- an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce an electric field within the plasma chamber;
- at least two of the following a thermal management system, a control system, a bias capacitor, a bias compensation power supply, a second nanosecond pulser, and an energy recovery circuit that are disposed within an enclosure;
- and
- a resistive output stage that includes an inductor and a capacitor arranged in series, wherein the inductor has an inductance less than about 200 μH.
A high voltage pulsing power supply comprising:
- a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width less than about 1 μs, and a pulse repetition frequency greater than about 20 kHz, wherein the high voltage pulser comprises:
- a plurality of switches;
- and
- a transformer coupled with the plurality of switches and the output, and having a transformer core;
- a plasma chamber;
- an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce an electric field within the plasma chamber;
- and
- a control module electrically coupled with the high voltage pulser, the control module measures the voltage of the pulses at the electrode and the control module modifies at least one of the voltage, pulse width, and pulse repetition frequency of the pulses in response to the measured voltage;
- wherein the high voltage pulser comprises:
- a thermal management subsystem comprising a plurality of cold plates coupled with the high voltage pulser;
- wherein the plurality of cold plates comprise:
- one or more switch cold plates coupled with the plurality of switches;
- and
- one or more transformer core cold plates coupled with the transformer core;
- wherein the thermal management subsystem comprises a fluid that flows through at least one of the plurality of cold plates.
A high voltage pulsing power supply comprising:
- a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width less than about 1 μs, and a pulse repetition frequency greater than about 20 kHz;
- a plasma chamber;
- an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce an electric field within the plasma chamber;
- wherein an inductance between the output of the high voltage pulser and at the electrode is less than about 10 μH;
- and
- wherein a capacitance between the output of the high voltage pulser and ground is less than about 10 nF.
Dependencies are inferred from the claim text.