Resist underlying film forming composition
AssigneeNissan Chemical Corporation
InventorsMamoru Tamura, Hiroto Ogata, Takahiro Kishioka
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Abstract
A resist underlayer film forming composition contains a resin containing a unit structure represented by formula (1): [in formula (1), R1 represents a thiadiazole group which is optionally substituted with a C1-6 alkyl group optionally interrupted by a carboxy group, a C1-6 alkyl group optionally substituted with a hydroxyl group, or a C1-4 alkylthio group, and R2 represents a hydrogen atom or formula (2): (in formula (2), R1 is the same as defined above, and * represents a binding moiety)]. The resist underlayer film forming composition provides a resist underlayer film which has excellent solvent resistance, excellent optical parameters, an excellent dry etching rate, and excellent embeddability.
Claims12
A resist underlying film forming composition comprising a resin comprising a unit structure represented by the following formula (1):
- wherein R1 represents a C1-C6 alkyl group optionally interrupted by a carboxyl group, a C1-C6 alkyl group optionally substituted with a hydroxyl group, or a thiadiazole group optionally substituted with a C1-C4 alkylthio group, and
- R2 represents a hydrogen atom or the following formula (2):
- wherein R1 is as defined above, and * indicates a bonding site.
A resist underlying film forming composition comprising a resin which is a reaction product of
- a resin (A) comprising an epoxy group with
- a compound (B) having (a) thiol group(s) that is at least one selected from the group consisting of thioglycolic acid, thioglycolic acid monoethanolamine, methyl thioglycolate, octyl thioglycolate, methoxybutyl thioglycolate, ethylene glycol bisthioglycolate, butanediol bisthioglycolate, hexanediol bisthioglycolate, trimethylolpropane tristhioglycolate, pentaerythritol tetrakisthioglycolate, 3-mercaptopropionic acid, methyl mercaptopropionate, methoxybutyl mercaptopropionate, octyl mercaptopropionate, tridecyl mercaptopropionate, ethylene glycol bisthiopropionate, butanediol bisthiopropionate, trimethylolpropane tristhiopropionate, pentaerythritol tetrakisthiopropionate, pentaerythritol tetrakis(3-mercaptobutyrate), trimethylolpropane tris(3-mercaptobutyrate), trimethylolethane tris(3-mercaptobutyrate), thioglycerol, 4-mercapto-5-methylthio-1,2,3-thiadiazole, 4-methylthio-5-mercapto-1,2,3-thiadiazole, 3-mercapto-4-methylthio-1,2,5-thiadiazole, 3-methylthio-4-mercapto-1,2,5-thiadiazole, 2-mercapto-5-methylthio-1,3,4-thiadiazole, 2-methylthio-5-mercapto-1,3,4-thiadiazole.
Dependencies are inferred from the claim text.