Resist composition, method of forming resist pattern, and compound
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTakuya Ikeda, Junichi Miyakawa
Life of this patent
Estimating the term…
Abstract
A resist composition containing a base material component (A) of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rbd1 to Rbd3 each independently represent an aryl group which may have a substituent, provided that at least two of Rbd1 to Rbd3 are aryl groups having one or more fluorine atoms as substituents, and at least one of the fluorine atoms of the aryl group is bonded to a carbon atom adjacent to a carbon atom that is bonded to the sulfur atom in the formula, and the total number of the fluorine atoms is 4 or more; X− represents a counter anion.
Claims4
A resist composition which generates an acid upon exposure and of which solubility in a developing solution is changed due to an action of an acid, the resist composition comprising:
- a base material component (A) of which solubility in a developing solution is changed due to an action of an acid;
- and
- a compound (BD1) represented by any one of formulas (bd-1-1) to (bd-1-15):
- wherein X− represents a counter anion.
A compound represented by any one of formulas (bd-1-1) to (bd-1-15),
- wherein X− represents a counter anion.
Dependencies are inferred from the claim text.