Method for manufacturing device, and composition

A method for manufacturing a device including a substrate and a second film disposed above the substrate, comprising:

• forming a first film above the substrate using a composition containing a polymerizable monomer and an oxidation inhibitor;
• and
• forming the second film by curing the first film in a state where at least one part of a mold having a convexo-concave pattern is in contact with the first film, or after at least one part of the mold is brought into contact with the first film,
• wherein the oxidation inhibitor is at least one of a hindered amine compound and a hindered phenol compound having a molecular weight of 700 or more,
• a repetition period of the pattern is 10 nm to 1 mm and a height of the pattern is 1 nm to 2 mm, and
• the composition satisfies a relationship of (t0(T)−tx(T))/t0(T)×100≤13.0,
• where t0(T) is a height of a convex part of a convexo-concave part of a cured film having the convexo-concave part obtained by forming a coating film using the composition and then by curing the coating film in a state where the coating film is in contact with a convexo-concave part in which a depth of a recess is 3 μm and a line width thereof is 5 μm, included in the mold, and
• tx(T) is a height of the convex part after the cured film is heated from 25° C. to 260° C. over five minutes, then a temperature of the cured film is held at 260° C. for five minutes, and the cured film is cooled to 25° C. over 30 minutes.