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US 11,635,170 B2Granted
Method, system, and device for storage and delivery of process gas from a substrate
AssigneeRASIRC, Inc.
InventorsRichard D. Blethen, Jeffrey J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Jr., Jian Yang, Ericca Lynne Speed
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Abstract
Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
Claims33
A method for delivering a gas, the method comprising:
- (a) contacting a process solution with a substrate within an enclosed housing such that the solution is adsorbed onto the substrate, thereby diluting the process solution within the substrate and forming a complex;
- (b) exposing the substrate to a carrier gas or a vacuum, thereby forming a gas stream comprising a gas phase of the process solution;
- and
- (c) delivering the gas stream to a critical process, application, or storage vessel, wherein the process solution is a hydrogen peroxide or a hydrazine, wherein the housing is configured to allow the carrier gas to flow through a head space contained within the housing or is configured to allow vacuum to be drawn through the head space, and wherein the head space is separated from the process solution by the substrate.
1 more element
Dependencies are inferred from the claim text.