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US 11,634,816 B2Granted
Method, system, and device for storage and delivery of process gas from a substrate
AssigneeRASIRC, Inc.
InventorsRichard D. Blethen, Jeffrey J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Jr., Jian Yang, Ericca Lynne Speed
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Abstract
Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
Claims26
A storage device for a process solution, the storage device comprising:
- (a) a housing having a substrate disposed therein;
- (b) a process solution contained within the housing and in fluid contact with the substrate such that the solution is adsorbed onto the substrate, thereby diluting the solution within the substrate and forming a complex;
- and
- (c) a head space contained within the housing and separated from the process solution by the substrate,
- wherein the process solution is a hydrogen peroxide or a hydrazine, and wherein the housing is configured to allow a carrier gas to flow through the head space or is configured to allow a vacuum to be drawn through the head space to produce a gas stream comprising a gas phase of the process solution to deliver the gas stream to a critical process, application or storage vessel.
2 more elements
A storage device for a process solution, the storage device comprising:
- (a) a housing having a substrate disposed therein, wherein the substrate is formed from a material selected from the group consisting of polyethylene/polyethylene terephthalate co-polymer (PE/PET), polyethylene/polypropylene co-polymer, Hydrophilic High Density Polyethylene (HDPE), Hydrophilic UHMW Polyethylene, and any combination thereof;
- (b) a process solution of contained within the housing and in fluid contact with the substrate such that the solution is adsorbed onto the substrate, thereby diluting the solution within the substrate and forming a complex;
- and
- (c) a head space disposed between input and output ports of the housing and separated from the process solution by the substrate,
- wherein the process solution is selected from the group consisting of hydrogen peroxide, hydrazine, mono-methyl hydrazine, tertiary butyl hydrazine, dimethylhydrazine, and any derivative thereof, and wherein the housing is configured to allow a carrier gas to flow through the head space or is configured to allow a vacuum to be drawn through the head space to produce a gas stream comprising a gas phase of the process solution to deliver the gas stream to a critical process, application or storage vessel.
2 more elements
Dependencies are inferred from the claim text.