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US 11,634,815 B2Granted
Method, system, and device for storage and delivery of process gas from a substrate
AssigneeRASIRC, Inc.
InventorsRichard D. Blethen, Jeffrey J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Jr., Jian Yang, Ericca Lynne Speed
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Abstract
Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
Claims30
A chemical delivery system comprising:
- (a) a process solution provided within a housing, wherein the process solution is in contact with a substrate disposed within the housing such that the solution is adsorbed onto the substrate, thereby diluting the process solution within the substrate and forming a complex;
- (b) a carrier gas or vacuum in fluid contact with a gas phase of the process solution, thereby forming a gas stream within the housing;
- and
- (c) an apparatus in fluid communication with the housing and configured for delivering the gas stream to a critical process, application or storage vessel,
- wherein the process solution is a hydrogen peroxide or a hydrazine, and wherein the housing is configured to allow the carrier gas to flow through a head space contained within the housing or is configured to allow vacuum to be drawn through the head space.
2 more elements
Dependencies are inferred from the claim text.