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US 11,634,670 B2Granted
Cleaning agent for semiconductor component, and use thereof
AssigneeToagosei Co., Ltd.
InventorsRyosuke Yamauchi, Akihiro Gotou
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Abstract
A semiconductor cleaning agent containing a sulfonic acid group-containing polymer, wherein a content of at least one metal selected from the group consisting of Na, Al, K, Ca and Fe is 0.7 ppm or less.
Claims16
A semiconductor component cleaning agent, comprising:
- a sulfonic acid group-containing polymer in an amount of 0.1% by mass or more and 40% by mass or less,
- wherein the sulfonic acid group-containing polymer has a structural unit derived from a (meth)acrylamide-2-methylpropane sulfonic acid or a salt thereof, and
- wherein a content of at least one kind of metal selected from the group consisting of Na, Al, K, Ca and Fe is not more than 0.7 ppm.
Dependencies are inferred from the claim text.