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US 11,634,213 B2Granted
High temperature oxidation protection for composites
AssigneeGoodrich Corporation
InventorsSteven A. Poteet, Gavin Charles Richards, Zachary Cohen
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Abstract
An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.
Claims7
A method for forming an oxidation protection system on a composite structure, comprising:
- applying a boron slurry to the composite structure, wherein the boron slurry comprises a boron compound and a first carrier fluid, wherein the boron compound comprises boron carbide;
- heating the composite structure to a temperature sufficient to form a boron layer on the composite structure;
- applying a silicon slurry to the composite structure, wherein the silicon slurry comprises a silicon compound and a second carrier fluid;
- heating the composite structure to a temperature sufficient to form a silicon layer on the composite structure;
- applying a first sealing slurry to the silicon layer, wherein the first sealing slurry comprises monoaluminum phosphate solution, phosphoric acid, a third carrier fluid, and a silicon-based surfactant;
- heating the composite structure to a temperature sufficient to form a first sealing layer;
- applying a second sealing slurry to the first sealing layer, wherein the second sealing slurry comprises monoaluminum phosphate solution and phosphoric acid;
- and
- heating the composite structure to a temperature sufficient to form a second sealing layer,
- wherein the first sealing layer and the second sealing layer are substantially free of phosphate glass.
7 more elements
Dependencies are inferred from the claim text.