Base material processing apparatus and base material processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorMitsuhiro Yoshida
Life of this patent
Estimating the term…
Loading patent…
AssigneeSCREEN Holdings Co., Ltd.
InventorMitsuhiro Yoshida
Estimating the term…
A base material processing apparatus includes a tension detector that detects tension on a base material that is being transported, an encoder that detects the amounts of rotational drive of rollers that transport the base material, edge position detectors that detect the position of an edge of the base material in the width direction, and a transport displacement calculation part that calculates a transport displacement of the base material in the transport direction. The transport displacement calculation part includes an operation unit that has completed learning through machine learning and outputs the transport displacement on the basis of at least one of the result of detecting the tension, the result of detecting the amounts of rotational drive of the rollers, and the result of detecting the position of the edge. Accordingly, the transport displacement can be detected with high accuracy and low cost.
A base material processing apparatus comprising:
A base material processing method for calculating a transport displacement of a long band-like base material in a transport direction while transporting the base material in a longitudinal direction of the base material along a transport path formed by a plurality of rollers, the method comprising:
A base material processing apparatus comprising:
Dependencies are inferred from the claim text.