Substrate
AssigneeLG Chem, Ltd.
InventorsCheol Ock Song, Seung Heon Lee, Ji Young Hwang, Han Min Seo, Nam Seok Bae, Jin Woo Park, Jung Sun You
Life of this patent
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Abstract
A substrate and a method for producing the same are disclosed herein. In some embodiments, a substrate includes a base layer, a black layer formed on the base layer, and column spacers formed on the black layer, wherein a loss rate of spacers measured by a peel test is 15% or less. The substrate can have excellent adhesiveness of the spacer to the base layer or the black layer and ensuring appropriate darkening properties. The method can effectively produce such a substrate without adverse effects such as occurrence of foreign materials without separate treatment such as heat treatment.
Claims11
A method for producing a substrate having a base layer, a black layer formed on the base layer and spacers formed on the black layer,
- the method comprising:
- pressing an imprinting mask onto a light curable resin layer disposed on the black layer to shape the light curable resin layer into the shape of the spacers;
- and
- irradiating the light curable resin layer to cure a portion of the light curable resin layer being shaped into the spacers,
- wherein the imprinting mask includes a light-shielding layer which shields remaining portions of the light curable resin layer that are not being shaped into the spacers,
- wherein a pressing speed of the imprinting mask is 0.3 mpm or more, and
- wherein a light quantity provided during irradiation of the light curable resin layer is 300 mJ/cm2 or more.
Dependencies are inferred from the claim text.