Skin cleansing composition
AssigneeKao Corporation
InventorsKeita Abe, Toshiaki Ozawa, Yuri Okutani, Daisuke Sawa
Life of this patent
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Abstract
The present invention relates to a skin cleansing composition which can sufficiently exhibit an excellent keratotic plug-removing effect without a burden such as pain and irritation on the skin. The skin cleansing composition comprises 0.08 mass % or more and 35 mass % or less of (X) 2-amino-2-methyl-1-propanol and has a pH of 9.3 or more and 12.5 or less at 25° C.
Claims17
A skin cleansing composition comprising 1 to 25 mass % of (X) 2-amino-2-methyl-1-propanol and having a pH of 9.5 or more and 12.5 or less at 25° C.,
- wherein said composition does not contain more than 3 mass % of a surfactant of Formula (1):
- R1O(CH2CH2O)mCH2COOM1,
- wherein R1 represents an alkyl or alkenyl group having 10 to 22 carbon atoms;
- m represents a number of 0.5 to 10 on average;
- and M1 represents a hydrogen atom, an alkali metal, an alkaline earth metal, ammonium, or organic ammonium.
A skin cleansing composition comprising 0.5 to 10 mass % of (X) 2amino-2-methyl-1-propanol, and 0.5 to 12 mass % of (Z) at least one member selected from the group consisting of 2-amino-2-hydroxymethyl-1,3-propanediol and 2-amino-2-methyl-1,3-propanediol, and having a pH of 9.5 or more and 12.5 or less at 25° C.,
- wherein a mass ratio of (X)/(Z) is 0.1 to 1.
Dependencies are inferred from the claim text.