A textured mask comprising a film, the film having a first substantially continuously flat surface lying in a first plane and a second surface opposite the first surface lying in a second plane substantially parallel to the first plane, the second surface being interrupted by a plurality of cavities, each of the cavities having a first depth defined by a third surface lying in a third plane substantially parallel to the first and second planes, the first depth being at a distance of from about 0.1 mm to about 5 mm from the second plane, and a second depth defined by a fourth surface lying in a fourth plane substantially parallel to the first and second planes, the second depth being at a distance of from about 0.1 mm to about 5 mm from the third plane, wherein the textured mask is at least partially coated with an opaque masking agent, wherein portions of the textured mask coated with the opaque masking agent are opaque to UV light radiation, and wherein portions of the textured mask that are not coated with the opaque masking agent remain transparent to UV light radiation and include the portions corresponding to the plurality of cavities.