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US 11,629,421 B2Granted
Mask having plating layers and method of manufacturing the same
AssigneeLG Display Co., Ltd.
InventorHyunjun Kim
Life of this patent
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Abstract
A mask and a method of manufacturing the same are disclosed. The method of manufacturing a mask includes forming a conductive layer on a pattern region and an auxiliary region around the pattern region of a substrate, placing the substrate including the conductive layer in a plating bath, forming a plating layer on the conductive layer, and separating the substrate and the conductive layer from the plating layer.
Claims9
A mask, comprising:
- a pattern region in a plurality of cell regions, the pattern region having a first plating layer;
- and
- an auxiliary region configured to be around the pattern region, the auxiliary region having a second plating layer;
- wherein the second plating layer between the plurality of cell regions positioned adjacent to a central portion of the plurality of cell regions has a different width than the second plating layer between the plurality of cell regions positioned adjacent to an outer peripheral portion of the plurality of cell regions.
1 more element
A mask, comprising:
- a substrate including a plurality of cell regions;
- a first plating layer in the plurality of cell regions;
- a second plating layer in an outer periphery of the plurality of cell regions;
- and
- a third plating layer between the plurality of cell regions, one of the second plating layer and the third plating layer having a same thickness as a thickness of the first plating layer;
- wherein the third plating layer positioned adjacent to a central portion of the plurality of cell regions has a different width than the third plating layer positioned adjacent to an outer peripheral portion of the plurality of cell regions.
3 more elements
Dependencies are inferred from the claim text.