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US 11,629,413 B2Granted
Amorphous metal strip and method for producing an amorphous metal strip
AssigneeVacuumschmelze GmbH & Co. KG
InventorsChristian Polak, Thomas Strache
Life of this patent
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Abstract
A method for the production of a metal strip is provided. The method includes providing an amorphous metal strip having a first main surface and a second, opposing main surface. The first and/or the second main surface are treated with a wet-chemical etching process and/or a photochemical etching process.
Claims28
A method for producing a metal strip, comprising:
- providing an amorphous metal strip having a first main surface and a second, opposing main surface,
- inspecting a surface and/or cross-section of the first and/or the second main surface of the amorphous metal strip using an optical inspection system and/or a profilometer,
- wet chemical etching the entire first and second main surfaces of the amorphous metal strip;
- after the wet chemical etching of the entire first and second main surfaces of the amorphous metal strip, covering at least parts of the first main surface and/or at least parts of the second main surface with a first chemically resistant coating, wherein the first chemically resistant coating is chemically resistant to etching fluid for the length of the etching process,
- wet-chemical etching at least one region of the first main surface which is not covered by the chemically resistant coating and/or at least one region of the second main surface which is not covered by the first chemically resistant coating, wherein the etching removes at least a part of the amorphous metal strip and reduces the surface roughness Ra and/or Rmax, and
- removing the first chemically resistant coating from the amorphous metal strip,
- photochemical etching the amorphous metal strip by applying a second chemically resistant and lateral structured coating to the first main surface of the amorphous metal strip,
- etching through non-coated areas of the amorphous metal strip from the first main surface with an etching fluid, wherein the second chemically resistant coating is chemically resistant to the etching fluid for the length of the etching process, and
- forming at least one part from the amorphous metal strip.
6 more elements
A method for producing a metal strip, comprising:
- providing an amorphous metal strip having a first main surface and a second, opposing main surface,
- inspecting a surface and/or cross-section of the first and/or the second main surface of the amorphous metal strip using an optical inspection system and/or a profilometer,
- covering at least parts of the first main surface and/or at least parts of the second main surface with a first chemically resistant coating, wherein the first chemically resistant coating is chemically resistant to etching fluid for the length of the etching process,
- wet-chemical etching at least one region of the first main surface which is not covered by the first chemically resistant coating and/or at least one region of the second main surface which is not covered by the chemically resistant coating, wherein the etching removes at least a part of the strip and reduces the surface roughness Ra and/or Rmax, and
- removing the first chemically resistant coating from the amorphous metal strip,
- photochemical etching the amorphous metal strip by applying a second chemically resistant and lateral structured coating to the first main surface of the amorphous metal strip,
- etching through the non-coated areas of the amorphous metal strip from the first main surface with an appropriate etching fluid, wherein the second chemically resistant coating is chemically resistant to etching fluid for the length of the etching process, and
- forming at least one part from the amorphous metal strip.
5 more elements
A method for producing a metal strip, comprising:
- providing an amorphous metal strip having a first main surface and a second, opposing main surface,
- inspecting a surface and/or cross-section of the first and/or the second main surface of the amorphous metal strip using an optical inspection system and/or a profilometer,
- wet chemical etching the entire first and second main surfaces of the amorphous metal strip;
- after the wet-chemically etching the entire first and second main surfaces of the amorphous metal strip, covering at least parts of the first main surface and/or at least parts of the second main surface with a chemically resistant coating, wherein the chemically resistant coating is chemically resistant to etching fluid for the length of the etching process,
- wet-chemical etching at least one region of the first main surface which is not covered by the chemically resistant coating and/or at least one region of the second main surface which is not covered by the chemically resistant coating, wherein the etching removes at least a part of the amorphous metal strip and reduces the surface roughness Ra and/or Rmax, and
- removing the chemically resistant coating from the amorphous metal strip.
3 more elements
A method for producing a metal strip, comprising:
- providing an amorphous metal strip having a first main surface and a second, opposing main surface,
- inspecting a surface and/or cross-section of the first and/or the second main surface of the amorphous metal strip using an optical inspection system and/or a profilometer, wet chemical etching the entire first and second main surfaces of the amorphous metal strip;
- wherein the etching removes at least a part of the strip and reduces the surface roughness Ra and/or Rmax, and
- subsequently, photochemical etching the strip by applying a chemically resistant and lateral structured coating to the first main surface of the metal strip,
- etching through the non-coated areas of the metal foil from the first main surface with an appropriate etching fluid, wherein the chemically resistant coating is chemically resistant to etching fluid for the length of the etching process, and forming at least one part from the strip.
2 more elements
Dependencies are inferred from the claim text.