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US 11,629,210 B2Granted
Maintenance liquid and maintenance method
AssigneeSeiko Epson Corporation
InventorsKeitaro Nakano, Chigusa Sato, Mitsuaki Yoshizawa
Life of this patent
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Abstract
There is provided a maintenance liquid, which is used in maintenance of a device equipped with a discharge head for discharging an ultraviolet ray curable-type composition containing the acyl phosphine oxide-based photopolymerization initiator toward an attachment object, including a polymerizable compound in which a saturation solubility of an acyl phosphine oxide-based photopolymerization initiator at 20° C. is equal to or greater than 5.0% by mass.
Claims20
A maintenance method, comprising:
- performing maintenance of a device equipped with a discharge head for discharging an ultraviolet ray curable-type composition containing an acyl phosphine oxide-based photopolymerization initiator toward an attachment object using a maintenance liquid having a polymerization inhibitor included in an amount that is equal to or greater than 0.05% by mass with respect to a total amount of the maintenance liquid and a polymerizable compound in which a saturation solubility of an acyl phosphine oxide-based photopolymerization initiator at 20° C. is equal to or greater than 5.0% by mass,
- wherein the polymerizable compound includes at least any one of (i) a vinyl ether group-containing (meth)acrylic acid ester represented by the following general formula (1), a content of the vinyl ether group-containing (meth)acrylic acid ester represented by general formula (1) being equal to or greater than 15% by mass with respect to the total amount of the maintenance liquid and (ii) a monofunctional (meth)acrylate compound having an aromatic ring, a content of the monofunctional (meth)acrylate compound having an aromatic ring being equal to or greater than 5% by mass, and equal to or less than 90% by mass with respect to the total amount of the maintenance liquid;
- CH2═CR1—COOR2—O—CH═CH—R3 (1)
- wherein R1 represents a hydrogen atom or a methyl group, R2 represents a divalent organic residue having 2 to 20 carbon atoms, and R3 represents a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms.
1 more element
Dependencies are inferred from the claim text.