Polishing pad, method for manufacturing polishing pad, and polishing method applying polishing pad

A polishing pad comprising a top pad as a polyurethane polishing layer,

• wherein the polyurethane polishing layer comprises a foamed body of a urethane composition,
• wherein the urethane composition comprises a urethane prepolymer, a curing agent, and a foaming agent,
• wherein the urethane prepolymer is a copolymer of a prepolymer composition comprising an isocyanate compound, an alcohol compound, and a fluorinated compound,
• wherein the fluorinated compound comprises a fluorinated repeating unit and comprises at least one end terminated with a hydroxyl, amine or epoxy group, and
• wherein the fluorinated repeating unit is present in an amount of 0.1% or greater by weight based on the total weight of the polyurethane;
• and the fluorinated repeating unit is represented by Formula 1:
• wherein R11 and R12 are each independently selected from the group consisting of hydrogen, C1-C10 alkyl groups, and fluorine, with the proviso that at least one of R11 and R12 is fluorine, L is a C1-C5 alkylene group or —O—, R13 and R14 are each independently selected from the group consisting of hydrogen, C1-C10 alkyl groups, and fluorine, with the proviso that at least one of R13 and R14 is fluorine, and n and m are each independently an integer from 0 to 20, with the proviso that n and m are not simultaneously 0.

A method for manufacturing a polishing pad, comprising

• i) preparing a polyurethane in a form of a foamed body with polymerizing a urethane composition,
• ii) manufacturing a top pad comprising the polyurethane, and
• iii) fixing the top pad to a sub-pad by lamination to prepare the polishing pad,
• wherein the urethane composition comprises a urethane prepolymer, a curing agent, and a foaming agent, and
• wherein the polyurethane comprises a fluorinated repeating unit represented by Formula 1, the fluorinated repeating unit is present in an amount of 0.1% or greater by weight based on the total weight of the polyurethane, and the polyurethane contains the fluorinated repeating unit within the main chain thereof;
• wherein R11 and R12 are each independently selected from the group consisting of hydrogen, C1-C10 alkyl groups, and fluorine, with the proviso that at least one of R11 and R12 is fluorine, L is a C1-C5 alkylene group or —O—, R13 and R14 are each independently selected from the group consisting of hydrogen, C1-C10 alkyl groups, and fluorine, with the proviso that at least one of R13 and R14 is fluorine, and n and m are each independently an integer from 0 to 20, with the proviso that n and m are not simultaneously 0.