Inductor structure and fabricating method thereof

An inductive device, comprising:

• at least one inductor structure, wherein the at least one inductor structure comprises:
• a first magnetic material layer;
• an insulation layer formed on the first magnetic material layer, wherein the insulation layer comprises a polymer structure of which a longitudinal length is greater than a lateral length, wherein the polymer structure comprises an arched upper surface, a first side surface, a second side surface, and a bottom surface in a longitudinal direction, wherein at least one of a corner between the arched upper surface and the first side surface and a corner between the arched upper surface and the second side surface is a rounded corner, and wherein at least one of an angle formed between the first side surface and the bottom surface and an angle formed between the second side surface and the bottom surface is less than 90 degree;
• at least one conductive wire structure which passes through the insulation layer;
• and
• a second magnetic material layer formed on the insulation layer.

A method of forming an inductor structure, comprising:

• forming a first magnetic material layer;
• forming a first photoresist layer, through which at least one conductive wire structure passes, over the first magnetic material layer;
• performing a pattern definition with lithography on the first photoresist layer;
• coating a second photoresist layer over the at least one conductive wire structure passes and a dielectric layer;
• developing the first photoresist layer and the second photoresist layer;
• and
• forming a second magnetic material layer on an insulation layer, wherein the insulation layer is formed on the first magnetic material layer.