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US 11,613,463 B2Granted
Vanadium nitride film, and member coated with vanadium nitride film and method for manufacturing the same
AssigneeDowa Thermotech Co., Ltd.
InventorsSatoru Habuka, Hiroyuki Matsuoka, Wataru Sakakibara
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Abstract
In a vanadium nitride film formed on a surface of a base material, a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration in the film is 1.08 or more and a chlorine element concentration in the film is 1 at % or more and 5 at % or less.
Claims4
A method for manufacturing a member coated with a vanadium nitride film, the method comprising:
- contacting a base material with a raw material gas containing a nitrogen source gas, a vanadium chloride gas, and a hydrogen gas, and converting the raw material gas into a plasma during a plasma chemical vapor deposition method to form the vanadium nitride film on a surface of the base material;
- wherein the vanadium nitride film formed on the surface of the base material during the plasma chemical vapor deposition method has a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration of 1.08 or more and a chlorine element concentration of 1 at % or more and 5 at % or less;
- and
- wherein a total of the vanadium element concentration and the nitrogen element concentration in the vanadium nitride film is 90 at % or more.
1 more element
A method for manufacturing a member coated with a vanadium nitride film, the method comprising:
- supplying into a chamber, the chamber comprising a base material, a raw material gas containing a nitrogen source gas, a vanadium chloride gas, and a hydrogen gas, and
- converting at least a portion of the raw material gas supplied into the chamber into a plasma during a plasma chemical vapor deposition method in which the base material is contacted with the plasma to form the vanadium nitride film on a surface of the base material;
- wherein the vanadium nitride film formed on the surface of the base material during the plasma chemical vapor deposition method has
- a ratio V [at %]/N [at %] between a vanadium element concentration and a nitrogen element concentration of 1.08 or more, and
- a chlorine element concentration of 1 at % or more and 5 at % or less;
- and
- wherein a total of the vanadium element concentration and the nitrogen element concentration in the vanadium nitride film is 90 at % or more.
4 more elements
Dependencies are inferred from the claim text.