Air-gap type film bulk acoustic resonator
AssigneeWisol Co., Ltd.
InventorsByung Hun Kim, Jong Hyeon Park, Yong Hun Ko, Hyoung Woo Kim
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AssigneeWisol Co., Ltd.
InventorsByung Hun Kim, Jong Hyeon Park, Yong Hun Ko, Hyoung Woo Kim
Estimating the term…
Disclosed is an air-gap type film bulk acoustic resonator (FBAR) including a substrate including an air-gap portion with a top surface in which a substrate cavity is formed, a lower electrode formed above the substrate while surrounding the air-gap portion, a piezoelectric layer formed above the lower electrode, and an upper electrode formed above the piezoelectric layer corresponding to a virtual area formed according to a vertical projection of the air-gap portion. Here, the piezoelectric layer includes a void portion having a piezoelectric cavity between the lower electrode and the upper electrode, and the void portion is formed below an edge portion corresponding to an end part of the upper electrode.
An air-gap type film bulk acoustic resonator (FBAR) comprising:
Dependencies are inferred from the claim text.