Magnetic film
Assignee3M Innovative Properties Company
InventorsSeong-Woo Woo, Jung Ju Suh, Charles L. Bruzzone, Jennifer J. Sokol, Sergei A. Manuilov
Life of this patent
Estimating the term…
Abstract
A magnetic film includes iron and copper distributed between opposing first and second major surfaces of the magnetic film. The copper has a first atomic concentration C1 at a first depth d1 from the first major surface and a peak second atomic concentration C2 at a second depth d2 from the first major surface, d2>d1, C2/C1≥5.
Claims4
A magnetic film comprising iron and copper distributed between opposing first and second major surfaces of the magnetic film, the copper having a first atomic concentration C1 at a first depth d1 from the first major surface and a peak second atomic concentration C2 at a second depth d2 from the first major surface, and a third atomic concentration C3 at a third depth d3 from the second major surface and a peak fourth atomic concentration C4 and a forth depth d4 from the second major surface, such that d2>d1, d4>d3, C2/C1>5, and C4/C3=5, wherein the magnetic film further comprises silicon and manganese and the silicon has a peak in the atomic concentration closer to the first major surface than depth d2.
Dependencies are inferred from the claim text.