Methods of forming conductive pipes between neighboring features, and integrated assemblies having conductive pipes between neighboring features
AssigneeMicron Technology, Inc.
InventorsAhmed Nayaz Noemaun, Stephen W. Russell, Tao D. Nguyen, Santanu Sarkar
Life of this patent
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Abstract
Some embodiments include an integrated assembly having a pair of substantially parallel features spaced from one another by an intervening space. A conductive pipe is between the features and substantially parallel to the features. The conductive pipe may be formed within a tube. The tube may be generated by depositing insulative material between the features in a manner which pinches off a top region of the insulative material to leave the tube as a void region under the pinched-off top region.
Claims56
An integrated assembly, comprising:
- a pair of substantially parallel features spaced from one another by an intervening space;
- a conductive pipe between the features and substantially parallel to the features;
- a first dielectric material being within the intervening space, under the conductive pipe, and along sidewalls of the features;
- a second dielectric material within the intervening space and over the first dielectric material;
- the second dielectric material being over and under the conductive pipe;
- and
- in a vertical cross section, the intervening space comprising a horizontal width dimension that is about the same as a horizontal width dimension of at least one of the pair of features.
An integrated assembly, comprising:
- a pair of substantially parallel features spaced from one another by an intervening space;
- a conductive pipe between the features and substantially parallel to the features;
- a first dielectric material being within the intervening space and directly under the conductive pipe, the first dielectric material against an uppermost surface of the pair of the substantially parallel features;
- and
- a second dielectric material within the intervening space.
An integrated assembly, comprising:
- a pair of substantially parallel features spaced from one another by an intervening space;
- a conductive pipe between the features and substantially parallel to the features;
- a first dielectric material being within the intervening space and extending conformally directly against an uppermost surface and sidewall of the pair of the substantially parallel features;
- a second dielectric material within the intervening space;
- and
- wherein, in a vertical cross section, a horizontal width dimension of the intervening space is about the same as a horizontal width dimension of at least one of the pair of features.
An integrated assembly, comprising:
- a pair of substantially parallel features spaced from one another by an intervening space, the pair of features defining a pitch P and the intervening space comprising a width of about ½ P;
- a conductive pipe between the features and substantially parallel to the features;
- a first dielectric material being within the intervening space;
- and
- a second dielectric material within the intervening space.
An integrated assembly, comprising:
- a pair of substantially parallel features spaced from one another by an intervening space;
- a conductive pipe between the features and substantially parallel to the features;
- a first dielectric material being within the intervening space and extending conformally directly against an uppermost surface and sidewall of the pair of the substantially parallel features;
- a second dielectric material within the intervening space;
- and
- wherein the pair of features define a pitch P and a horizontal width dimension of the intervening space comprises a width of about ½ P.
Dependencies are inferred from the claim text.