Integrated circuit e-fuse having an e-fuse element providing a diffusion barrier for underlying e-fuse terminals
AssigneeMicrochip Technology Incorporated
InventorYaojian Leng
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AssigneeMicrochip Technology Incorporated
InventorYaojian Leng
Estimating the term…
An electronic fuse (e-fuse) module may be formed in an integrated circuit device. The e-fuse module may include a pair of metal e-fuse terminals (e.g., copper terminals) and an e-fuse element formed directly on the metal e-fuse terminals to define a conductive path between the pair of metal e-fuse terminals through the e-fuse element. The metal e-fuse terminals may be formed in a metal interconnect layer, along with various interconnect elements of the integrated circuit device. The e-fuse element may be formed by depositing and patterning a diffusion barrier layer over the metal e-fuse terminals and interconnect elements formed in the metal interconnect layer. The e-fuse element may be formed from a material that provides a barrier against metal diffusion (e.g., copper diffusion) from each of the metal e-fuse terminals and interconnect elements. For example, the e-fuse element may be formed from titanium tungsten (TiW) or titanium tungsten nitride (TiW2N).
A method of forming an integrated circuit structure, comprising:
A method of forming an integrated circuit structure, comprising:
Dependencies are inferred from the claim text.