Pedestal assembly for a substrate processing chamber

A processing region comprising:

• a sealing assembly;
• and
• a pedestal assembly configured to move between a processing position and a transfer position, the pedestal assembly comprising:
• a substrate support;
• first pins coupled to the substrate support, configured to mate with first terminals of an electrostatic chuck, and configured to couple to a first power source, each of the first pins comprises:
• an interface element;
• and
• a compliance element supporting the interface element;
• second pins coupled to the substrate support, configured to mate with second terminals of the electrostatic chuck, and configured to couple to a second power source;
• alignment elements coupled to the substrate support and configured to interface with centering elements of the electrostatic chuck;
• and
• a flexible element coupled to the substrate support, configured to interface with a passageway of the electrostatic chuck and configured to couple to a gas source, wherein when the pedestal assembly is the processing position, a portion of the electrostatic chuck is configured to mate with a portion of the sealing assembly to form a processing volume.

A cluster tool assembly comprising:

• a central transfer apparatus comprising a transfer arm, the transfer arm comprising first pins configured to mate with first terminals of an electrostatic chuck;
• and
• a processing region comprising;
• a pedestal assembly configured to move between a processing position and transfer position, the pedestal assembly comprising:
• a substrate support;
• second pins coupled to the substrate support, configured to mate with second terminals of the electrostatic chuck, and configured to couple to a first power source, each of the second pins comprises:
• an interface element;
• and
• a compliance element supporting the interface element;
• third pins coupled to the substrate support, configured to mate with third terminals of the electrostatic chuck, and configured to couple to a second power source;
• alignment elements coupled to the substrate support and configured to interface with centering elements of the electrostatic chuck;
• and
• a flexible element coupled to the substrate support, configured to interface with a passageway of the electrostatic chuck and configured to couple to a gas source.