Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process

A process chamber, comprising:

• a chamber body having an interior volume therein;
• a substrate support disposed in the interior volume;
• a target disposed in the interior volume opposite the substrate support to at least partially define a process volume therebetween;
• a process shield disposed about the substrate support and the target to define an outer boundary of the process volume, wherein the process shield and the target define a dark space gap therebetween, and wherein the process shield includes a plurality of annular trenches with a plurality of slots disposed therebetween to fluidly couple the plurality of annular trenches to the dark space gap;
• and
• an isolator ring disposed between the target and the process shield, and a gas flow path extending between an inner sidewall of the isolator ring and an outer sidewall of the process shield adjacent an innermost of the plurality of annular trenches.