Power supply devices for plasma systems and method of use
AssigneeTRUMPF Huettinger GmbH + Co. KG
InventorsChristian Bock, Christian Thome
Life of this patent
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Abstract
Power supply devices for generating at least one electric high-frequency power signal for a plasma having at least a first plasma state and a second plasma state are provided. The power supply devices are configured to determine a first variable that characterizes a power reflected by the plasma in the first plasma state, determine a second variable that characterizes a power reflected by the plasma in the second plasma state, generate a third variable based on the first variable and the second variable, and control at least one of a frequency or a power of the high-frequency power signal based on the third variable.
Claims23
A power supply device comprising:
- at least one power supply component configured to generate at least one electric high-frequency power signal for a plasma having at least a first plasma state and a second plasma state;
- and
- a controller configured to provide at least one control signal to the at least one power supply component,
- wherein the controller is configured to:
- determine a first variable that characterizes a first power reflected by the plasma in the first plasma state,
- determine a second variable that characterizes a second power reflected by the plasma in the second plasma state,
- generate a third variable based on the first variable and the second variable, and
- control at least one of a frequency or a power of the high-frequency power signal based on the third variable.
A method of operating a power supply device for generating at least one electric high-frequency power signal for a plasma having at least a first plasma state and a second plasma state, the method comprising:
- determining a first variable that characterizes a first power reflected by the plasma in the first plasma state;
- determining a second variable that characterizes a second power reflected by the plasma in the second plasma state;
- generating a third variable based on the first variable and the second variable;
- and
- controlling at least one of a frequency or a power of the high-frequency power signal based on the third variable.
A method for regulating an impedance matching device coupled between a power supply device and a plasma chamber, the method comprising:
- operating the power supply device to generate at least one electric high-frequency power signal for a plasma generated in the plasma chamber, the plasma having at least a first plasma state and a second plasma state, the operating comprising:
- determining a first variable that characterizes a first power reflected by the plasma in the first plasma state,
- determining a second variable that characterizes a second power reflected by the plasma in the second plasma state,
- generating a third variable based on the first variable and the second variable, and
- controlling at least one of a frequency or a power of the high-frequency power signal based on the third variable;
- and
- regulating the impedance matching device at least based on the third variable.
Dependencies are inferred from the claim text.