Lithographic process and apparatus and inspection process and apparatus
AssigneeASML Netherlands B.V.
InventorsWim Tjibbo Tel, Hans Erik Kattouw, Valerio Altini, Bearrach Moest
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Abstract
A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
Claims20
A method of configuring an inspection apparatus for measuring a pattern applied to a substrate associated with a patterning device, the method comprising:
- identifying different functional areas from a device layout of the patterning device;
- and
- configuring a control grid of the inspection apparatus based on the identified different functional areas.
A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
- identify different functional areas from a device layout of a patterning device used to apply a pattern to a substrate;
- and
- configure, based on the identified different functional areas, a control grid of an inspection apparatus for measuring the pattern applied to the substrate.
Dependencies are inferred from the claim text.