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US 11,599,024 B2Granted
Photopolymerizable resin composition, display device using same, and manufacturing method thereof
AssigneeSamsung Display Co., Ltd.
InventorsHoon Kang, Yong-Hoon Yang, Yang-Ho Jung, Seon Hwa Choi
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Abstract
A photopolymerizable resin composition includes a first layer and a second layer; and a barrier layer disposed between the first layer and the second layer, the barrier layer includes one or more of SiNx, SiOx, SiON, Mo, a Mo oxide, Cu, a Cu oxide, Al, an Al oxide, Ag, and a Ag oxide.
Claims31
A multilayer photoresist comprising:
- a first layer made of a first photoresist material;
- a second layer made of a second photoresist material;
- and
- a transparent barrier layer disposed between the first layer and the second layer and in direct contact with both the first layer and the second layer, wherein
- the transparent barrier layer comprises a Mo oxide,
- the transparent barrier layer is thinner than the first layer and the second layer, and
- the transparent barrier layer is not in contact with the substrate.
4 more elements
A method for manufacturing a multilayer photoresist, comprising:
- applying a first layer of a photoresist, the first layer being made of a first photoresist material;
- forming a transparent barrier layer on the first layer;
- applying a second layer of the photoresist on the transparent barrier layer, the second layer being made of a second photoresist material;
- after applying the second layer, applying a mask and exposing the photoresist to light;
- and
- simultaneously etching the first layer and the second layer of the exposed photoresist, wherein
- the first layer, the transparent barrier layer, and the second layer have different etching rates, and
- the forming of the transparent barrier layer comprises forming the transparent barrier layer of a Mo oxide.
5 more elements
A display device comprising:
- a first substrate;
- a transistor disposed on the first substrate;
- a pixel electrode connected with the transistor;
- and
- a photoresist disposed on the pixel electrode, wherein
- the photoresist comprises:
- a first layer and a second layer, and
- a barrier layer disposed between the first layer and the second layer, and an area of the second layer is different from that of the first layer.
5 more elements
Dependencies are inferred from the claim text.