Substrate state determining apparatus, substrate processing apparatus, model generating apparatus, and substrate state determining method

A substrate processing apparatus comprising:

• a processing container;
• a stage that is rotatably accommodated in the processing container and has a recessed portion on a surface thereof;
• and
• a substrate state determining circuit that determines a state of a substrate placed in the recessed portion of the stage,
• wherein the substrate state determining circuit includes:
• a memory;
• and
• a processor coupled to the memory and configured to:
• execute a machine learning using training data in which information indicating a state of a substrate is attached to an image of the substrate disposed on the stage wherein the image is taken by a camera, thereby generating a substrate state determination model in which the image of the substrate is taken as an input and a value related to the state of the substrate corresponding to the image of the substrate is taken as an output;
• and
• determine the state of the substrate corresponding to the image of the substrate captured by the camera, using the substrate state determination model generated by executing the machine learning,
• wherein the training data includes:
• a first image of a state where the substrate is placed in the recessed portion, and an entirety of an end of the substrate is warped upward and is present above the surface of the stage,
• a second image of a state where the substrate is placed in the recessed portion, and a center of the substrate is warped upward and is present above the surface of the stage,
• a third image of a state where the substrate is placed in the recessed portion, and a portion of the end of the substrate is warped upward and is present above the surface of the stage, and
• a fourth image of a state where the substrate is not warped and an entirety of the substrate is present below the surface of the stage.

A model generating apparatus comprising:

• a memory;
• and
• a processor coupled to the memory and configured to:
• execute a machine learning using training data in which information indicating a state of a substrate is attached to an image of the substrate placed in a recessed portion formed on a surface of a stage, thereby generating a substrate state determination model in which the image of the substrate is taken as an input and a value related to the state of the substrate corresponding to the image of the substrate is taken as an output,
• wherein the training data includes:
• a first image of a state where the substrate is placed in the recessed portion, and an entirety of an end of the substrate is warped upward and is present above the surface of the stage,
• a second image of a state where the substrate is placed in the recessed portion, and a center of the substrate is warped upward and is present above the surface of the stage,
• a third image of a state where the substrate is placed in the recessed portion, and a portion of the end of the substrate is warped upward and is present above the surface of the stage, and
• a fourth image of a state where the substrate is not warped and an entirety of the substrate is present below the surface of the stage.

A substrate state determining method comprising:

• performing a learning by executing a machine learning using training data in which information indicating a state of a substrate is attached to an image of the substrate placed in a recessed portion formed on a surface of a stage, thereby generating a substrate state determination model in which the image of the substrate is taken as an input and a value related to the state of the substrate corresponding to the image of the substrate is taken as an output;
• capturing an image of the substrate placed on the stage;
• and
• determining the state of the substrate corresponding to the image of the substrate captured in the capturing an image, using the substrate state determination model generated in the performing a learning,
• wherein the training data includes:
• a first image of a state where the substrate is placed in the recessed portion, and an entirety of an end of the substrate is warped upward and is present above the surface of the stage,
• a second image of a state where the substrate is placed in the recessed portion, and a center of the substrate is warped upward and is present above the surface of the stage,
• a third image of a state where the substrate is placed in the recessed portion, and a portion of the end of the substrate is warped upward and is present above the surface of the stage, and
• a fourth image of a state where the substrate is not warped and an entirety of the substrate is present below the surface of the stage.